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The Cleanest, Bubble-Free Ozone Water Solution

GORE® Ozonation Modules are successfully used in an ozone water-based wafer cleaning tool for silicon wafer and semiconductor applications. They provide a safer and more effective treatment using deionized ozone water (DI-O3 water) than commonly used methods involving harsh chemicals and many semiconductor cleaning process steps.

Features & Benefits
Applications
Technology Comparison
Benefits to Semiconductor Cleaning Equipment Manufacturers of using GORE Ozonation Modules:
  • Bubble-free, ultra-high purity ozone water at highest concentration up to 200 mg/L
  • Cleanest ozone water due to unique fluoropolymer construction
  • No particle contamination due to ePTFE membrane tube
  • High WEP > 0.40 MPa due to microporous membrane technology
  • Proven continuous and consistent operation
  • Easy-to-control ozone water flow rate and concentration
Image
Modules in ozone water systems for clean silicon wafer & FPD applications

GORE Ozonation Modules are a cost-effective solution for use in leading-edge SEMI process ozone water applications and cleaning processes with ozone in the microelectronics industry, like:

  • Silicon wafer cleaning and production
  • Logic and memory fabrication
  • LED/OLED/QOLED (LTPS) flat panel display cleaning & production
  • Photomask
GORE Ozonation Modules Compared to Other Ozone-Dissolving Technologies

GORE Ozonation Modules continuously and consistently dissolve ozone gas into ultra-high pure water to generate the cleanest, bubble-free ozone water – cleaner than ozone water generated by mechanical mixer technology, like an ejector or static mixer.

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Infograph showing water ozone dissolution modules for silicon wafers

The dissolving ozone-in-water mechanism in GORE Ozonation Modules is diffusion based on the difference in total gas pressure, which generates the cleanest bubble-free ozone water.

Critical AttributesGORE Ozonation ModulesMechanical Mixers
(injector/ejector & static mixer)
Cleanliness
  • Bubble-free
  • No particles within O3 gas with ePTFE ozone dissolving membrane
  • Potential ozone water bubbles from direct injection of O3 gas
  • No filtration function removing particles within O3 gas
Operability
  • Consistent high-concentration ozone water
  • Consistent ozonized ultra-pure water flow rate
     
  • Inconsistency due to the effect of water and gas pressure fluctuation
Gore Technologies Offer Improvements throughout Semiconductor Manufacturing Processes

Gore Technologies in Semiconductor Manufacturing Processes

With decades of unique materials science technology and in-depth application knowledge, Gore offers proven solutions that ensure cleanliness, durability and reliability.

GORE® Ozonation Modules for Semiconductor & Microelectronics Fabrication Processing

GORE Ozonation Modules for Semiconductor & Microelectronics Fabrication Processing

Ozone-dissolving modules from Gore are the proven, reliable solution for improved semiconductor and microelectronics cleaning process performance and yield.

Technical Information

These values demonstrate the characteristics of GORE Ozonation Modules for semiconductor and microelectronics processing.

Property

Gore Part Number

GN-142-300GN-142-650
Length (Flange-to-Flange) mm300650
Diameter mm142142
Membrane MaterialExpanded PTFEExpanded PTFE
Housing MaterialPTFE/PFAPTFE/PFA
Ozone Concentration ppmUp to 200Up to 200
Water Entry Pressure (WEP) MPa> 0.40> 0.40
Maximum Liquid Pressure MPaG0 to 0.350 to 0.35
Maximum Gas Pressure MPaG0.250.25
Recommended Operating Temperature °C0 to +300 to +30

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FOR INDUSTRIAL USE ONLY 

Not for use in food, drug, cosmetic or medical device manufacturing, processing, or packaging operations.

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